Properties of the interfacial layer in the high-k gate stack and transistor performance

Keyphrases

• Interfacial Layer 100%
• Stack Performance 100%
• High-k Gate Stack 100%
• Transistor Performance 100%
• Chemical Oxide 100%
• Thermal Oxide 66%
• Structural Properties 33%
• High Density 33%
• Electrical Properties 33%
• HfO2 Films 33%
• Kappa Coefficient 33%
• Oxygen Atom 33%
• Fixed Charge 33%
• Low Temperature 33%
• Gate Stack 33%
• Si Substrate 33%
• Oxide Interfaces 33%
• Oxygen Removal 33%
• Low Mobility 33%
• SiO2 Layer 33%
• Oxides 33%

Engineering

• Interfacial Layer 100%
• Gate Stack 100%
• Low-Temperature 33%
• Oxygen Atom 33%
• Si Substrate 33%

Material Science

• Oxide Compound 100%
• Transistor 100%
• Density 20%
• Oxide Interface 20%
• Film 20%