Preparation and characteristics of thin film with wear-resistant behavior on HDPE surface polymerized by C2H2-H2-SiH4 plasma

Xiangping Zou; Xiaosu Yi; Zhenkui Fang

doi:10.1002/(sici)1097-4628(19981121)70:8<1561::aid-app13>3.3.co;2-x

Preparation and characteristics of thin film with wear-resistant behavior on HDPE surface polymerized by C₂H₂-H₂-SiH₄ plasma

Xiangping Zou, Xiaosu Yi, Zhenkui Fang

Research output: Journal Publication › Article › peer-review

Abstract

Plasma-polymerized deposition of an acetylene-hydrogen-silane mixture (C₂H₂-H₂-SiH₄) to obtain thin film with good wear behavior on a high-density polyethylene (HDPE) surface was present in this work. It was found that the bond between thin film and HDPE substrate was excellent and H₂ gas in system led the deposited thin film to better adhesive properties, but slower thin film deposition rate. Surface wear-resistant properties of modified HDPE were improved with the input of SiH₄. Infrared and X-ray photoelectron spectroscopy spectra suggested that there be large quantities of >C=O, O-H, C-Si, and Si-O groups in thin film and that the ratio of C to Si was increased due to the addition of SiH₄ and H₂, which inferred that the thin film structure and components lie between organic and inorganic materials.

Original language	English
Pages (from-to)	1561-1566
Number of pages	6
Journal	Journal of Applied Polymer Science
Volume	70
Issue number	8
DOIs	https://doi.org/10.1002/(sici)1097-4628(19981121)70:8<1561::aid-app13>3.3.co;2-x
Publication status	Published - 21 Nov 1998
Externally published	Yes

Keywords

Adhesive strength
Plasma polymerization
Surface properties
Thin film
Wear resistance behavior

ASJC Scopus subject areas

General Chemistry
Surfaces, Coatings and Films
Polymers and Plastics
Materials Chemistry

Access to Document

10.1002/(sici)1097-4628(19981121)70:8<1561::aid-app13>3.3.co;2-x

Cite this

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title = "Preparation and characteristics of thin film with wear-resistant behavior on HDPE surface polymerized by C2H2-H2-SiH4 plasma",

abstract = "Plasma-polymerized deposition of an acetylene-hydrogen-silane mixture (C2H2-H2-SiH4) to obtain thin film with good wear behavior on a high-density polyethylene (HDPE) surface was present in this work. It was found that the bond between thin film and HDPE substrate was excellent and H2 gas in system led the deposited thin film to better adhesive properties, but slower thin film deposition rate. Surface wear-resistant properties of modified HDPE were improved with the input of SiH4. Infrared and X-ray photoelectron spectroscopy spectra suggested that there be large quantities of >C=O, O-H, C-Si, and Si-O groups in thin film and that the ratio of C to Si was increased due to the addition of SiH4 and H2, which inferred that the thin film structure and components lie between organic and inorganic materials.",

keywords = "Adhesive strength, Plasma polymerization, Surface properties, Thin film, Wear resistance behavior",

author = "Xiangping Zou and Xiaosu Yi and Zhenkui Fang",

year = "1998",

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doi = "10.1002/(sici)1097-4628(19981121)70:8<1561::aid-app13>3.3.co;2-x",

language = "English",

volume = "70",

pages = "1561--1566",

journal = "Journal of Applied Polymer Science",

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TY - JOUR

T1 - Preparation and characteristics of thin film with wear-resistant behavior on HDPE surface polymerized by C2H2-H2-SiH4 plasma

AU - Zou, Xiangping

AU - Yi, Xiaosu

AU - Fang, Zhenkui

PY - 1998/11/21

Y1 - 1998/11/21

N2 - Plasma-polymerized deposition of an acetylene-hydrogen-silane mixture (C2H2-H2-SiH4) to obtain thin film with good wear behavior on a high-density polyethylene (HDPE) surface was present in this work. It was found that the bond between thin film and HDPE substrate was excellent and H2 gas in system led the deposited thin film to better adhesive properties, but slower thin film deposition rate. Surface wear-resistant properties of modified HDPE were improved with the input of SiH4. Infrared and X-ray photoelectron spectroscopy spectra suggested that there be large quantities of >C=O, O-H, C-Si, and Si-O groups in thin film and that the ratio of C to Si was increased due to the addition of SiH4 and H2, which inferred that the thin film structure and components lie between organic and inorganic materials.

AB - Plasma-polymerized deposition of an acetylene-hydrogen-silane mixture (C2H2-H2-SiH4) to obtain thin film with good wear behavior on a high-density polyethylene (HDPE) surface was present in this work. It was found that the bond between thin film and HDPE substrate was excellent and H2 gas in system led the deposited thin film to better adhesive properties, but slower thin film deposition rate. Surface wear-resistant properties of modified HDPE were improved with the input of SiH4. Infrared and X-ray photoelectron spectroscopy spectra suggested that there be large quantities of >C=O, O-H, C-Si, and Si-O groups in thin film and that the ratio of C to Si was increased due to the addition of SiH4 and H2, which inferred that the thin film structure and components lie between organic and inorganic materials.

KW - Adhesive strength

KW - Plasma polymerization

KW - Surface properties

KW - Thin film

KW - Wear resistance behavior

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